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CVDALD Equipment Product List

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DLI-CVD/DLI-ALD device "MC-050"

Due to lamp heating, RTP and RTCVD processing is possible! Quartz tube-type chamber.

The MC-050 is a DLI-CVD/DLI-ALD system compatible with substrates up to 50mm in diameter. The maximum film formation temperature is 1100°C (lamp heating method), and it can accommodate up to 6 DLI evaporators. Additionally, it can have a maximum of 8 mass flow controllers and is equipped with a turbo pump. Please feel free to contact us for inquiries. 【Features】 ■ Compatible with substrates up to 50mm in diameter ■ Maximum film formation temperature: 1100°C (lamp heating method) ■ Can accommodate up to 6 DLI evaporators ■ Mass flow controllers: up to 8 ■ Quartz tube-type chamber *For more details, please refer to the PDF document or feel free to contact us.

Company：ハイテック・システムズ
Price：Other

Annealing furnace
CVDALD Equipment

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DLI-CVD/DLI-ALD device "MC-100/MC-200"

The maximum film-forming temperature is 800°C! It can accommodate up to 4x DLI evaporators with the chamber heating mechanism.

The "MC-100/MC-200" is a DLI-CVD/DLI-ALD system with a stainless steel chamber. It supports substrates up to 200mm in diameter, with a maximum of 8 mass flow controllers for the "MC-100" and 6 for the "MC-200," and it can be equipped with a turbo pump. Please feel free to consult us when you need assistance. 【Features】 ■ Supports substrates up to 200mm in diameter ■ Maximum film deposition temperature: 800℃ ■ Capable of accommodating up to 4x DLI evaporators ■ Mass flow controllers: up to 8 ■ Stainless steel chamber *For more details, please refer to the PDF document or feel free to contact us.